Size determination of ICs. (A) Topography (left panel) and shaded topography (right panel) AFM images of LF-anti-LF, artificial ICs. Scale bar represents 1 μm on the left panel. (Inset) Scale bar represents 200 nm. (Right panel) Scale bar represents 250 nm. Images were captured at room temperature using a PSIA XE-100 AFM with a XEP1.5 acquisition software. The imaging medium was air. Topography images were processed with XEI 1.6 software using the Sobel Edge Enhancement method. (B) The histogram represents particle size distribution. For the analysis of particles, ImageJ software (Version 1.42q) was used. (C) DLS analysis of LF-anti-LF, OVA-anti-OVA, IgM-anti-IgM ICs. Arrows indicate peaks overlapping with MP sizes. (D) RA SF ICs were isolated on an anti-IgG and anti-IgM agarose columns and were also analyzed by DLS. Arrows indicate peaks overlapping with MP sizes. The x-axis is set to logarithmic scale; a(rh) denotes the coefficient of autocorrelation function of the scattered electric field. DLS experiments were carried out at 21°C.
